Self-aligned repeatedly stackable 3d vertical rram

ABSTRACT

An integrated circuit structure includes a first material block comprising a first block insulator layer and a first multilayer stack on the first block insulator layer, the first multilayer stack comprising interleaved pillar electrodes and insulator layers. A second material block is stacked on the first material block and comprises a second block insulator layer, and a second multilayer stack on the second block insulator layer, the second multilayer stack comprising interleaved pillar electrodes and insulator layers. At least one pillar extends through the first material block and the second material block, wherein the at least one pillar has a top width at a top of the first and second material blocks that is greater than a bottom width at a bottom of the first and second material blocks.

TECHNICAL FIELD

Embodiments of the disclosure are in the field of integrated circuitstructures and, in particular, self-aligned repeatedly stackable 3Dvertical RRAM.

BACKGROUND

For the past several decades, the scaling of features in integratedcircuits has been a driving force behind an ever-growing semiconductorindustry. Scaling to smaller and smaller features enables increaseddensities of functional units on the limited real estate ofsemiconductor chips. For example, shrinking transistor size allows forthe incorporation of an increased number of memory devices on a chip,lending to the fabrication of products with increased functionality. Thedrive for ever-more functionality, however, is not without issue. It hasbecome increasingly significant to rely heavily on innovativefabrication techniques to meet the exceedingly tight tolerancerequirements imposed by scaling.

Embedded memory with non-volatile memory devices, e.g., on-chip embeddedmemory with non-volatility can enable energy and computationalefficiency. A non-volatile memory device such as resistive random accessmemory (RRAM) device or magnetic tunnel junction (MTJ) memory device iscoupled with selector element to form a memory cell. A large collectionof memory cells forms a key component of non-volatile embedded memory.However, with scaling of memory devices, the technical challenges ofassembling a vast number of memory cells presents formidable roadblocksto commercialization of this technology today.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 illustrates a cross-sectional view of an angled view of astate-of-the-art vertical RRAM.

FIGS. 2A-2B illustrates a vertical resistive memory array fabricated inaccordance with the present embodiments.

FIG. 3 illustrates a phase diagram for PS-b-PMMA, where one polymer ishereinafter referred to as PS (polystyrene) and the second polymer asPMMA (polymethylmethacrylate).

FIGS. 4A-4H illustrates a method of fabricating an integrated circuitstructure comprising vertical RRAM array is disclosed.

FIG. 5 illustrates a vertical RRAM configured as a hexagonal array.

FIGS. 6A and 6B are top views of a wafer and dies that a self-alignedrepeatedly stackable 3D vertical RRAM, in accordance with one or more ofthe embodiments disclosed herein.

FIG. 7 illustrates a block diagram of an electronic system, inaccordance with an embodiment of the present disclosure.

FIG. 8 is a cross-sectional side view of an integrated circuit (IC)device assembly that may include a self-aligned repeatedly stackable 3Dvertical RRAM, in accordance with one or more of the embodimentsdisclosed herein.

FIG. 9 illustrates a computing device in accordance with oneimplementation of the disclosure.

DESCRIPTION OF THE EMBODIMENTS

Embodiments for a self-aligned repeatedly stackable 3D vertical RRAM aredescribed. In the following description, numerous specific details areset forth, such as specific material and tooling regimes, in order toprovide a thorough understanding of embodiments of the presentdisclosure. It will be apparent to one skilled in the art thatembodiments of the present disclosure may be practiced without thesespecific details. In other instances, well-known features, such assingle or dual damascene processing, are not described in detail inorder to not unnecessarily obscure embodiments of the presentdisclosure. Furthermore, it is to be understood that the variousembodiments shown in the Figures are illustrative representations andare not necessarily drawn to scale. In some cases, various operationswill be described as multiple discrete operations, in turn, in a mannerthat is most helpful in understanding the present disclosure, however,the order of description should not be construed to imply that theseoperations are necessarily order dependent. In particular, theseoperations need not be performed in the order of presentation.

Certain terminology may also be used in the following description forthe purpose of reference only, and thus are not intended to be limiting.For example, terms such as “upper”, “lower”, “above”, “below,” “bottom,”and “top” refer to directions in the drawings to which reference ismade. Terms such as “front”, “back”, “rear”, and “side” describe theorientation and/or location of portions of the component within aconsistent but arbitrary frame of reference which is made clear byreference to the text and the associated drawings describing thecomponent under discussion. Such terminology may include the wordsspecifically mentioned above, derivatives thereof, and words of similarimport.

Embodiments described herein may be directed to front-end-of-line (FEOL)semiconductor processing and structures. FEOL is the first portion ofintegrated circuit (IC) fabrication where the individual devices (e.g.,transistors, capacitors, resistors, etc.) are patterned in thesemiconductor substrate or layer. FEOL generally covers everything up to(but not including) the deposition of metal interconnect layers.Following the last FEOL operation, the result is typically a wafer withisolated transistors (e.g., without any wires).

Embodiments described herein may be directed to back end of line (BEOL)semiconductor processing and structures. BEOL is the second portion ofIC fabrication where the individual devices (e.g., transistors,capacitors, resistors, etc.) are interconnected with wiring on thewafer, e.g., the metallization layer or layers. BEOL includes contacts,insulating layers (dielectrics), metal levels, and bonding sites forchip-to-package connections. In the BEOL part of the fabrication stagecontacts (pads), interconnect wires, vias and dielectric structures areformed. For modern IC processes, more than 10 metal layers may be addedin the BEOL.

Embodiments described below may be applicable to FEOL processing andstructures, BEOL processing and structures, or both FEOL and BEOLprocessing and structures. In particular, although an exemplaryprocessing scheme may be illustrated using a FEOL processing scenario,such approaches may also be applicable to BEOL processing. Likewise,although an exemplary processing scheme may be illustrated using a BEOLprocessing scenario, such approaches may also be applicable to FEOLprocessing.

Non-volatile memory devices such as a resistive random access memory(RRAM) device depend on a phenomenon of resistance switching to storeinformation. The non-volatile memory device functions as a variableresistor where the resistance of the device may switch between a highresistance state and a low resistance state. A non-volatile memorydevice may be coupled with a selector element to form a memory cell. Theselector may be a volatile switching element that is placed in serieswith the non-volatile memory device. A large collection of such memorycells forms a key component of non-volatile embedded memory.

In accordance with one or more embodiments of the present invention,fabrication processes are described for a vertically integrated memory,such as 3D RRAM, that is self-aligned and repeatedly stackable withoutrequiring the use of multiple lithography process steps to increase thenumber of layers or height of the RRAM. One or more embodimentsdescribed herein are directed to structures for and approaches to usinga self-aligned and repeatedly stackable 3D vertical RRAM. In anembodiment, such a memory array is fabricated in the BEOL layers of anintegrated circuit. The performance of such a memory may be faster thanflash memory, and may be made with higher density than flash memory. Inaccordance with one or more embodiments of the present disclosure, avertical string of memory elements is described. Such an architecturemay provide a very dense memory architecture since it is a vertical ratein contrast to a planar memory array. The processes here in are alsoapplicable magnetoresistive random-access memory (MRAM) and phase-changememory (PCRAM).

To provide context, FIG. 1 illustrates a cross-sectional view of anangled view of a state-of-the-art vertical RRAM. The dashed box shows anenlarged cross-section of the vertical RRAM. The vertical RRAM 100includes a lattice array of interleaved metal plane electrodes 102 andinsulator layers 104 (e.g., silicon nitride, silicon oxide and the like)having pillars 106 formed there through. Each of the pillars 106comprise a pillar electrode 108 and switching layer 110 around thepillar electrode 108. The pillar electrode 108 may serve as a topelectrode, while the plane electrode 102 may serve as a bottomelectrode, and the switching layer 110 is located along sidewalls of thepillars 106 between the pillar electrode 108 and the plain electrode102. The switching layers 110 are required for RRAM integration due totheir non-linear/rectifying I-V characteristics which serve to minimizeleakage current from such devices. Individual memory cells 112 aredefined at the junction of the pillars 106 and the plane electrodes 102.

The process of fabricating the vertical RRAM may include the followingsteps: performing lithography to stack the insulator layers 104 and theplain electrodes 102 alternately; optionally etching the plainelectrodes 102 to form staircases at an edge of the array; etching holesin the plane electrode 102 and insulator layers 104 and depositing oneor more oxides along sidewalls of the holes to form the switching layer110; and depositing a metal in a remainder of the hole to form thepillar electrodes 102; and separating the plane electrodes 102 to formneighboring memory cells 112.

Higher density RRAM may be achieved by stacking as many layers of planeelectrodes 102 and insulator layers 104 as possible. However, when theinterleaved plane electrodes 102 and insulator layers 104 are etched toform the pillars 106, it is not possible to create a perfectly verticaletch angle, resulting in the pillars 106 having sloped walls where thediameter/width of the pillars 106 increases with the number of stackedlayers. Consequently, the number of layers that can be stacked islimited before the non-vertical pillars from adjacent cells come intocontact. One solution to this problem is to perform multiple lithographysteps to reset the etch angle. However, the issue is that increasing thenumber of lithography steps increases the fabrication cost of the RRAM.

Accordingly, example embodiments disclosed herein allow for thefabrication of a self-aligned repeatedly stackable 3D vertical RRAM thatdoes not experience the above limitations. The example embodiments donot rely on repeated lithography steps to fabricate the self-alignedvertical RRAM array. Instead, the example embodiments are enabledthrough direct self-assembly (DSA) and processing sequences torepeatedly stack layers and increase the number of vertical memory cellswithout adjacent pillars becoming too close.

To exemplify the present embodiments, FIGS. 2A-2B are diagrams of avertical resistive memory array fabricated in accordance with thepresent embodiments. FIG. 2A illustrates an angled three-dimensionalview of an integrated circuit structure comprising the vertical memoryarray. In one embodiment, the vertical memory array 200 may represent a3D RRAM array. FIG. 2B illustrates a cross-sectional views of thevertical memory array of FIG. 2B along line AA.

Referring to FIGS. 2A and 2B, the vertical memory array 200 isfabricated as stacked material blocks 202, where the width of thepillars is redefined in each of each the material blocks 202. Twostacked material blocks 202 are shown in this example, a first materialblock 202 a and second material block 202 b stacked on the firstmaterial block. Each of the material blocks 202 comprises a respectiveblock insulator layer 204 and a multilayer stack 206 on the blockinsulator layer 204. The multilayer stack 206 comprises interleavedplane electrodes 208 and insulator layers 210. The plane electrodes 208and insulator layers 210 are shown formed in a horizontal direction overa substrate 206, but are not limited to any particular orientation.

The multilayer stack 206 further includes a plurality of pillars 212that extend through each of the material blocks 202. In one embodiment,the pillars 212 exit through a bottom one of the material blocks 202 andmay be coupled to conductive lines, such as select lines and/orbitlines, as shown. Respective ones of the pillars 212 comprise aswitching layer 214 and a pillar electrode 216, where the switchinglayer 214 is formed along sidewalls of the pillar 212. In oneembodiment, the switching layer 214 and a pillar electrode 216 areconcentric cylinders, which form a cylindrical pillar 212. However, thepillars 212, the switching layer 214 and pillar electrode 216 may be anyshape, e.g., elliptical, square, rectangular and the like.

In one embodiment, the pillar electrode 216 may comprise any conductivemetal, such as Cu, Ru, Co, W, Cu doped, Ag-doped, Au-doped, Ta-doped,other metals and silicides. In one embodiment, the pillar electrode 216is less than 100 nm in width. In one embodiment, the switching layer 214may comprise more than one layer (e.g., a memory layer and a selectorlayer). In one embodiment, the switching layer 214 may comprisematerials such as TaOx, NbOx, VOx, Al2O3, HfOx, TaHfOx, TiOx, HfTiOx,HfNiOx, HfNbOx, TaNbOx, NiOx, PCMO, LSMO, In2O3, TaOx, NiOx, IGZO, ZnO,and composites thereof. In one embodiment, the switching layer 214 maybe approximately 5-14 nm in thickness.

In an embodiment, the plane electrodes 208 may function as word lines.In one embodiment, the plane electrodes 208 may have a thickness ofapproximately 15-25 nm, or preferably 20 nm. In one embodiment, theplane electrodes 208 may comprise any conductive metal such as titaniumnitride or platinum, for example. In one embodiment, the insulatorlayers 210 may comprise any oxide or nitride, such as silicon nitride.In one embodiment, the insulator layers 210 may have a thickness ofapproximately 20 nm to 50 nm.

Referring to FIG. 2B, according the disclosed embodiments, the width ofthe pillars 212 is redefined in each of each material blocks 202. Morespecifically, the pillars 212 in respective ones of the material blocks202 have a top width (TW) at a top of the material block 202 that isgreater than a bottom width (BW) at a bottom of the respective materialblock 202 due to the non-vertical etch angle of the pillars 212. As willbe appreciated, the dimensions of the pillars 212 in each of thematerial blocks 202 have substantially the same dimensions such that theTWs and the BWs of one material block 202 a are equal to the TWs and theBWs of another material block 202 b. In one embodiment, TW may be lessthan approximately 100 nm.

According the disclosed embodiments, the top widths are reset for eachof the material blocks 202 by utilizing a direct self-assembly (DSA)processing sequence, with creates pillars 212 that are self-aligned fromone material block 202 to the next. DSA utilizes principles ofchemoepitaxy and graphoepitaxy to depose a block copolymer comprisingfirst and second polymer components onto a top surface of each of thematerial blocks 202. An example of a block copolymer ispolystyrene-b-polymethylmethacrylate (PS-b-PMMA), as shown in FIG. 3.

FIG. 3 illustrates a phase diagram for PS-b-PMMA, where one polymer ishereinafter referred to as PS (polystyrene) 302 and the second polymeras PMMA (polymethylmethacrylate) 304. Using chemoepitaxy,molecules/chemicals nominally called “brushes” are grafted (i.e.,covalently bound) to the top surface of each new material block 202 toguide the polymer components to specific locations. The block copolymerdistributes in a manner such that one of the polymer components 302,e.g., PS adheres to a conductive region, such as the pillar 212, whilethe second polymer component 304, e.g., PMMA, adheres to the material ofthe insulator layer 210. However, because the block copolymer is appliedto the wafer/substrate on which the RRAM is formed, the substrate willhave detectable amounts of the first polymer component and a secondpolymer component thereon. These molecules/brushes interact favorablywith one of the polymer components (a 1-brush or single color scheme),or two brushes may be selected that interact with one polymer componentbut not the other (a 2-brush or two color scheme). Thesebrushes/polymers for DSA process are commercially available. Similarly,block copolymers may also be commercially available. The polymers can bereadily engineered to provide different properties. Thesemolecules/chemicals can be readily engineered to provide differentproperties.

The disclosed embodiments are advantageous in the sense that aself-aligned pillar is introduced and replaces repeated lithographysteps. This allows for a greater number of vertical devices to bestacked without exceeding the capability of etch processes.Consequently, the disclosed embodiments enable increased verticalscaling at less cost.

As an exemplary processing scheme involving fabrication of aself-aligned repeatedly stackable 3D vertical RRAM, refer to thefollowing Figures illustrating views of various stages in a method offabricating a vertical memory array integrated circuit structure inaccordance with an embodiment of the present disclosure, where likecomponents have like reference numerals.

Referring to FIGS. 4A-4H, cross-sectional views illustrating a method offabricating an integrated circuit structure comprising vertical RRAMarray 400 are disclosed, where like components from FIGS. 2A and 2B havelike reference numerals.

FIG. 4A illustrates that the process may begin with forming materialblock 202 a in which a block insulator layer 204 is formed over asubstrate (not shown), and a multilayer stack 206 of alternatinghorizontal plane electrodes 208 and horizontal insulator layers 210 isformed over the block insulator layer 204. An array of pillars 212 isformed through multilayer stack 206 and the block insulator layer 204using standard etch and lithographic processing. The switching layer 214is conformingly formed on sidewalls of the pillars 212, followed bydepositing the pillar electrode 216 material.

Although vertical RRAM array 400 shows two plane electrodes 208 andthree insulator layers 210, any number of alternatingconductor/insulator pairs may be utilized. The plane electrodes 208 maybe comprised of a metal such as Pt, Ti, Al, Ta, Ti, Ru or ofelectrically conductive materials such as TiN or other suitableconductive metals or materials. The insulator layer 210 may be comprisedof silicon dioxide, silicon oxynitride, silicon nitride, or othersuitable insulating oxides, nitrides or carbides or of other materials.These depositions may be performed via a plasma-enhanced CVD process, anatomic-layer deposition process or via other suitable depositionprocesses.

FIG. 4B illustrates the vertical RRAM array 400 after performing adirect self-assembly (DSA) process on a surface of the multilayer stackof the material block 202 a to begin formation of second material block202 b, wherein a first polymer component, such as PS (polystyrene) 302adheres to the pillar 212 and a second polymer component, such as PMMA(polymethylmethacrylate) 304 adheres to a top one of the insulatinglayer 210 of the material block 202 a. Although the use of a PS/PMMAblock copolymer will be described according to one embodiment,alternative block copolymers may also be used.

Direct self-assembly (DSA) is used to order the polymer components ofthe block copolymer in a defined manner, specifically, utilizingtechniques of graphoepitaxy and chemoepitaxy. In graphoepitaxy, thesurface of either the insulator layer 210 or the pillar 212 is coated towet one of the polymer components. Using chemoepitaxy,molecules/chemicals nominally called “brushes” are grafted (i.e.,covalently bound) to the top surfaces to guide the polymer components tospecific locations. These molecules/brushes interact favorably with oneof the polymer components (a 1-brush or single color scheme), or twobrushes may be selected that interact with one polymer component but notthe other (a 2-brush or two color scheme). These brushes/polymers forDSA process are commercially available. Similarly, block copolymers mayalso be commercially available. The polymers can be readily engineeredto provide different properties. These molecules/chemicals can bereadily engineered to provide different properties.

One key parameter of interest is the Flory-Huggins X parameter whichdescribes how energetically favorable it is for the two polymercomponents 302 and 304 to mix. By controlling this parameter, themorphology of the resultant system (including the length of the polymercomponents 302 and 304) can be controlled when the polymer components302 and 304 are mixed in contact with a metallic or insulating surface.

The bottom of FIG. 3 also illustrates a phase diagram for PS-b-PMMAdemonstrating possible DSA morphologies as a function (f) of the firstpolymer component (A) 302, the second polymer component (B) 304, and theFlory-Huggins X_(n) value. Once applied, the two different polymercomponents will segregate depending on the fractions of the firstpolymer component (A) 302 relative to the second polymer component (B)304, and the effect of changing the relative ratios is shown in theresultant morphologies of FIG. 3. “A” and “B” can represent either PS orPMMA, since the phase diagram is symmetric about f_(A)=0.5. For example,PS-b-PMMA can be formulated in a symmetric 50:50 blend that produceslamellar self-assembled domains. If the fraction is adjusted to 30:70 or70:30, the polymer produces cylinders of the minority fraction assembledin a hexagonal pattern in a sea of the majority fraction.

According to the present disclosure, DSA f_(A) values that producecylinder or spherical morphologies may be used to introduce self-alignedpillars 212 through multiple stacked material blocks 202. Thelength-scale of the morphologies resultant from polymer deposition fromFIG. 3 may also be engineered as may be the thickness of the polymercoating applied to the pillars 212 and insulator layer 210. The X valueis multiplied by the overall number of monomer units, n, in each blockfraction of the chain to produce an X_(n) value that dictates theintrinsic periodicity of the assembled system. Longer block copolymerchain lengths, with correspondingly higher X_(n) values, produce longerintrinsic periodicities. In such a manner, a polymer can be engineeredto form structures of different dimensions so that a polymer componentthat is adjacent to one conductive pillar 212 does not bridge to thepolymer component adjacent to a neighboring insulating layer 210.

During the chemoepitaxy process, a PS-attractive thiol brush (not shown)is first grafted directly to a top surface of the pillars 212. The thiolbrush bridges the top surface of the pillars 212 provided the width ofpillars 212 is less than an intrinsic periodicity. If the width of thepillars 212 is greater than the characteristic length, the polymer willnot fully bridge the pillars 212. Next, a second brush, based on analcohol or phosphate end group is grafted to the block insulator layers204 dielectric surfaces. Depending upon the Flory-Huggins X_(n) valueand the width of the pillars 212, the resultant morphology of the blockcopolymer is changed in a well-controlled and predictable manner. In oneembodiment, the higher the Flory-Huggins X_(n) value during thegraphoepitaxy process, the more unfavorable it is for the blockcopolymers to mix. In one embodiment, an X_(n) value of approximatelymay be 40-60 is selected, such that the first polymer component 302(e.g., PS) adheres to the pillars 212, while the second polymercomponent 304 (e.g., PMMA) fills in the remaining regions of thematerial block 202 a on the top insulator layer 210.

Referring again to FIG. 4B, the PS polymer component 302 is shownassembled over the pillars 212 and the PMMA polymer component 304 isshown assembled over the top insulator layer 210. In a manner describedabove, a BCP system may be customized for pillars 212 having ofdifferent widths/diameters. This process is highly repeatable. Accordingto a further aspect of the example embodiments, the process may be toneinverted to swap the PS/PMMA regions in the resultant structure. Forexample, in an alternative embodiment, a PMMA attractive thiol brush, ora PS attractive hydroxyl brush, may be used such that the PS polymercomponent 302 assembles over the insulating layers 210 and the PMMApolymer component 304 assembles over the pillars 212.

Various embodiments presented herein discuss forming the DSA layers,where the block copolymer may be PS-b-PMMA. However, in other examples,any other appropriate type of polymers may also be used. Examples ofsuch polymers include, but are not limited to,poly(styrene)-b-poly(2-vinylpyridine) (PS-b-P2VP),poly(styrene)-b-poly(4-vinylpyridine) (PS-b-P4VP),poly(styrene)-b-poly(acrylic acid) (PS-b-PAA),poly(styrene)-b-poly(ethylene glycol) (PS-b-PEG),poly(styrene)-b-poly(imide) (PS-b-P1), andpoly(styrene)-b-poly(dimethylsiloxane) (PS-b-PDMS). For any of theseblock co-polymers additives can be introduce to modify the pitch, andX_(n) value of the system. These systems and their processing may be atleast in part analogous to the BCP comprising the PS-b-PMMA systemdiscussed herein.

FIG. 4C illustrates the vertical RRAM array 400 after the PMMA polymercomponent 304 is removed from insulator layer 210 via a PMMA etch; asecond block insulator 402 of a second material block 202 b is formed onthe first material block 202 a in place of the removed PMMA; and the PSpolymer component 302 is removed from the pillars 212 using an ashprocess.

FIG. 4D illustrates the vertical RRAM array 400 after a multilayer stack404 of alternating horizontal plane electrodes 208 and horizontalinsulator layers 210 is conformally formed over the block insulatorlayer 402 of the second material block 202 b, and a metal 406, such asone comprising the pillar electrode 212, is filled in and polishedcoplanar with a top of the multilayer stack 404.

FIG. 4E illustrates the vertical RRAM array 400 after a second DSAprocess is performed on a top surface of material block 202 b to definea location of the pillar 212 through the material block 202 b that isself-aligned with a location of the pillar 212 in the material block 202a. The DSA process results in the PS polymer component 302 adhering toand being centered on the metal 406, and the PMMA component 302 adheringto the insulator layer 210. In one embodiment, the PS polymer component302 has a length that matches the bottom width (BW) of the pillar at thebottom of the original material block 202 a, effectively resetting thewidth of the pillar in the next material block 202 b.

Figure F illustrates the vertical RRAM array 400 after the PMMAcomponent 302 is removed via a PMMA etch and replaced with a hardmask408, and both the PS polymer component 302 and the hardmask 408 are timepolished to a predetermined thickness. In one embodiment thepredetermined thickness is a minimum thickness required for downstreametching performed in Figure G. The PS polymer component 302 is used as amaterial that helps define the hardmask 408.

Figure G illustrates the vertical RRAM array 400 after the PS polymercomponent 302 is removed by an ash process and a dry etch is performedto remove materials thereunder, including the metal 406, down to thepillar 212 at the top of the material block 202 a. Notice, the dry etchresults in sloped sidewalls that effectively resets the width (TW) ofthe pillar at a top of the second material block 202 b.

Figure H illustrates the vertical RRAM array 400 after the hardmask 408is removed, and switching layer 410 is deposited on sidewalls anddepositing and polishing the pillar to form a second portion of thepillar 212 in material block 202 b to extend the pillar 212 through boththe material blocks 202 b and 202 a. The pillar 212 is formed througheach of the material blocks 202 a and 202 b, but the portions of thepillar 212 in each of the material blocks have a top width (TW) that isgreater than a bottom width (BW), as shown and described in FIG. 2B.

In summary, an exemplary fabrication process of a self-alignedrepeatedly stackable 3D vertical RRAM may including forming a firstmaterial block over a substrate, the first material block comprising afirst block insulator layer, a first multilayer stack on the blockinsulator layer, the first multilayer stack comprising interleavedpillar electrodes and insulator layers. A second material block isformed on the first material block, where the second material blockcomprises a second block insulator layer, a second multilayer stack onthe block insulator layer, the second multilayer stack comprisinginterleaved pillar electrodes and insulator layers. During fabricationof the first material block and the second material block, at least onepillar is formed that extends through the first material block and thesecond material block, wherein the at least one pillar is formed using aDSA process such that the pillar has a top width at a top of the firstand second material blocks that is greater than a bottom width at abottom of the first and second material blocks. At this point, thevertical memory is completed and additional processing may form astaircase contact or other contact structure.

FIG. 5 is a diagram illustrating a vertical RRAM configured as ahexagonal array. In one embodiment, arranging the RRAM as the hexagonalarray 500 is preferred for the DSA process and results in high packingdensity.

The disclosed embodiment describe a DSA (direct self-assembly) processfor fabricating a RRAM to increase the height of the RRAM and the numberof RRAM layers without multiple lithography steps. The above process maybe applied to other memory types such as magnetoresistive random-accessmemory (MRAM) and phase-change memory (also known as PCRAM, PCM, PCME,PRAM, OUM (ovonic unified memory) and C-RAM or CRAM (chalcogenide RAM)).

The integrated circuit structures described herein may be included in anelectronic device. As an example of one such apparatus, FIGS. 6A and 6Bare top views of a wafer and dies that a self-aligned repeatedlystackable 3D vertical RRAM, in accordance with one or more of theembodiments disclosed herein.

Referring to FIGS. 6A and 6B, a wafer 600 may be composed ofsemiconductor material and may include one or more dies 602 havingintegrated circuit (IC) structures formed on a surface of the wafer 600.Each of the dies 602 may be a repeating unit of a semiconductor productthat includes any suitable IC (e.g., ICs including self-alignedrepeatedly stackable 3D vertical RRAM, such as described above. Afterthe fabrication of the semiconductor product is complete, the wafer 600may undergo a singulation process in which each of the dies 602 isseparated from one another to provide discrete “chips” of thesemiconductor product. In particular, structures that include embeddednon-volatile memory structures having an independently scaled selectoras disclosed herein may take the form of the wafer 600 (e.g., notsingulated) or the form of the die 602 (e.g., singulated). The die 602may include one or more self-aligned repeatedly stackable 3D verticalRRAM and/or supporting circuitry to route electrical signals, as well asany other IC components. In some embodiments, the wafer 600 or the die602 may include an additional memory device (e.g., a static randomaccess memory (SRAM) device), a logic device (e.g., an AND, OR, NAND, orNOR gate), or any other suitable circuit element. Multiple ones of thesedevices may be combined on a single die 602. For example, a memory arrayformed by multiple memory devices may be formed on a same die 602 as aprocessing device or other logic that is configured to store informationin the memory devices or execute instructions stored in the memoryarray.

Embodiments disclosed herein may be used to manufacture a wide varietyof different types of integrated circuits and/or microelectronicdevices. Examples of such integrated circuits include, but are notlimited to, processors, chipset components, graphics processors, digitalsignal processors, micro-controllers, and the like. In otherembodiments, semiconductor memory may be manufactured. Moreover, theintegrated circuits or other microelectronic devices may be used in awide variety of electronic devices known in the arts. For example, incomputer systems (e.g., desktop, laptop, server), cellular phones,personal electronics, etc. The integrated circuits may be coupled with abus and other components in the systems. For example, a processor may becoupled by one or more buses to a memory, a chipset, etc. Each of theprocessor, the memory, and the chipset, may potentially be manufacturedusing the approaches disclosed herein.

FIG. 7 illustrates a block diagram of an electronic system 700, inaccordance with an embodiment of the present disclosure. The electronicsystem 700 can correspond to, for example, a portable system, a computersystem, a process control system, or any other system that utilizes aprocessor and an associated memory. The electronic system 700 mayinclude a microprocessor 702 (having a processor 704 and control unit706), a memory device 708, and an input/output device 710 (it is to beappreciated that the electronic system 700 may have a plurality ofprocessors, control units, memory device units and/or input/outputdevices in various embodiments). In one embodiment, the electronicsystem 700 has a set of instructions that define operations which are tobe performed on data by the processor 704, as well as, othertransactions between the processor 704, the memory device 708, and theinput/output device 710. The control unit 706 coordinates the operationsof the processor 704, the memory device 708 and the input/output device710 by cycling through a set of operations that cause instructions to beretrieved from the memory device 708 and executed. The memory device 708can include a vertical memory array as described in the presentdescription. In an embodiment, the memory device 708 is embedded in themicroprocessor 702, as depicted in FIG. 7. In an embodiment, theprocessor 704, or another component of electronic system 700, includes aself-aligned repeatedly stackable 3D vertical RRAM, such as thosedescribed herein.

FIG. 8 is a cross-sectional side view of an integrated circuit (IC)device assembly that may include a self-aligned repeatedly stackable 3Dvertical RRAM, in accordance with one or more of the embodimentsdisclosed herein.

Referring to FIG. 8, an IC device assembly 800 includes componentshaving one or more integrated circuit structures described herein. TheIC device assembly 800 includes a number of components disposed on acircuit board 802 (which may be, e.g., a motherboard). The IC deviceassembly 800 includes components disposed on a first face 840 of thecircuit board 802 and an opposing second face 842 of the circuit board802. Generally, components may be disposed on one or both faces 840 and842. In particular, any suitable ones of the components of the IC deviceassembly 800 may include a number of self-aligned repeatedly stackable3D vertical RRAM, such as disclosed herein.

In some embodiments, the circuit board 802 may be a printed circuitboard (PCB) including multiple metal layers separated from one anotherby layers of dielectric material and interconnected by electricallyconductive vias. Any one or more of the metal layers may be formed in adesired circuit pattern to route electrical signals (optionally inconjunction with other metal layers) between the components coupled tothe circuit board 802. In other embodiments, the circuit board 802 maybe a non-PCB substrate.

The IC device assembly 800 illustrated in FIG. 8 includes apackage-on-interposer structure 836 coupled to the first face 840 of thecircuit board 802 by coupling components 816. The coupling components816 may electrically and mechanically couple the package-on-interposerstructure 836 to the circuit board 802, and may include solder balls (asshown in FIG. 8), male and female portions of a socket, an adhesive, anunderfill material, and/or any other suitable electrical and/ormechanical coupling structure.

The package-on-interposer structure 836 may include an IC package 820coupled to an interposer 804 by coupling components 818. The couplingcomponents 818 may take any suitable form for the application, such asthe forms discussed above with reference to the coupling components 818.Although a single IC package 820 is shown in FIG. 8, multiple ICpackages may be coupled to the interposer 804. It is to be appreciatedthat additional interposers may be coupled to the interposer 804. Theinterposer 804 may provide an intervening substrate used to bridge thecircuit board 802 and the IC package 820. The IC package 820 may be orinclude, for example, a die (the die 602 of FIG. 6B), or any othersuitable component. Generally, the interposer 804 may spread aconnection to a wider pitch or reroute a connection to a differentconnection. For example, the interposer 804 may couple the IC package820 (e.g., a die) to a ball grid array (BGA) of the coupling components818 for coupling to the circuit board 802. In the embodiment illustratedin FIG. 8, the IC package 820 and the circuit board 802 are attached toopposing sides of the interposer 804. In other embodiments, the ICpackage 820 and the circuit board 802 may be attached to a same side ofthe interposer 804. In some embodiments, three or more components may beinterconnected by way of the interposer 804.

The interposer 804 may be formed of an epoxy resin, afiberglass-reinforced epoxy resin, a ceramic material, or a polymermaterial such as polyimide. In some implementations, the interposer 804may be formed of alternate rigid or flexible materials that may includethe same materials described above for use in a semiconductor substrate,such as silicon, germanium, and other group III-V and group IVmaterials. The interposer 804 may include metal interconnects 810 andvias 808, including but not limited to through-silicon vias (TSVs) 806.The interposer 804 may further include embedded devices 814, includingboth passive and active devices. Such devices may include, but are notlimited to, capacitors, decoupling capacitors, resistors, inductors,fuses, diodes, transformers, sensors, electrostatic discharge (ESD)devices, and memory devices. More complex devices such asradio-frequency (RF) devices, power amplifiers, power managementdevices, antennas, arrays, sensors, and microelectromechanical systems(MEMS) devices may also be formed on the interposer 804. Thepackage-on-interposer structure 836 may take the form of any of thepackage-on-interposer structures known in the art.

The IC device assembly 800 may include an IC package 824 coupled to thefirst face 840 of the circuit board 802 by coupling components 822. Thecoupling components 822 may take the form of any of the embodimentsdiscussed above with reference to the coupling components 818, and theIC package 824 may take the form of any of the embodiments discussedabove with reference to the IC package 820.

The IC device assembly 800 illustrated in FIG. 8 includes apackage-on-package structure 834 coupled to the second face 842 of thecircuit board 802 by coupling components 828. The package-on-packagestructure 834 may include an IC package 826 and an IC package 832coupled together by coupling components 830 such that the IC package 826is disposed between the circuit board 802 and the IC package 832. Thecoupling components 828 and 830 may take the form of any of theembodiments of the coupling components 818 discussed above, and the ICpackages 826 and 832 may take the form of any of the embodiments of theIC package 820 discussed above. The package-on-package structure 834 maybe configured in accordance with any of the package-on-packagestructures known in the art.

The computing device 900 houses a board 902. The board 902 may include anumber of components, including but not limited to a processor 904 andat least one communication chip 906. The processor 904 is physically andelectrically coupled to the board 902. In some implementations the atleast one communication chip 906 is also physically and electricallycoupled to the board 902. In further implementations, the communicationchip 906 is part of the processor 904.

Depending on its applications, computing device 900 may include othercomponents that may or may not be physically and electrically coupled tothe board 902. These other components include, but are not limited to,volatile memory (e.g., DRAM), non-volatile memory (e.g., ROM), flashmemory, a graphics processor, a digital signal processor, a cryptoprocessor, a chipset, an antenna, a display, a touchscreen display, atouchscreen controller, a battery, an audio codec, a video codec, apower amplifier, a global positioning system (GPS) device, a compass, anaccelerometer, a gyroscope, a speaker, a camera, and a mass storagedevice (such as hard disk drive, compact disk (CD), digital versatiledisk (DVD), and so forth).

The communication chip 906 enables wireless communications for thetransfer of data to and from the computing device 900. The term“wireless” and its derivatives may be used to describe circuits,devices, systems, methods, techniques, communications channels, etc.,that may communicate data through the use of modulated electromagneticradiation through a non-solid medium. The term does not imply that theassociated devices do not contain any wires, although in someembodiments they might not. The communication chip 906 may implement anyof a number of wireless standards or protocols, including but notlimited to Wi-Fi (IEEE 802.11 family), WiMAX (IEEE 802.8 family), IEEE802.20, long term evolution (LTE), Ev-DO, HSPA+, HSDPA+, HSUPA+, EDGE,GSM, GPRS, CDMA, TDMA, DECT, Bluetooth, derivatives thereof, as well asany other wireless protocols that are designated as 3G, 4G, 5G, andbeyond. The computing device 900 may include a plurality ofcommunication chips 906. For instance, a first communication chip 906may be dedicated to shorter range wireless communications such as Wi-Fiand Bluetooth and a second communication chip 906 may be dedicated tolonger range wireless communications such as GPS, EDGE, GPRS, CDMA,WiMAX, LTE, Ev-DO, and others.

The processor 904 of the computing device 900 includes an integratedcircuit die packaged within the processor 904. In some implementationsof the disclosure, the integrated circuit die of the processor includesa self-aligned repeatedly stackable 3D vertical RRAM, in accordance withimplementations of embodiments of the disclosure. The term “processor”may refer to any device or portion of a device that processes electronicdata from registers and/or memory to transform that electronic data intoother electronic data that may be stored in registers and/or memory.

The communication chip 906 also includes an integrated circuit diepackaged within the communication chip 906. In accordance with anotherimplementation of embodiments of the disclosure, the integrated circuitdie of the communication chip includes a self-aligned repeatedlystackable 3D vertical RRAM, in accordance with implementations ofembodiments of the disclosure.

In further implementations, another component housed within thecomputing device 900 may contain an integrated circuit die that includesa self-aligned repeatedly stackable 3D vertical RRAM, in accordance withimplementations of embodiments of the disclosure.

In various implementations, the computing device 900 may be a laptop, anetbook, a notebook, an ultrabook, a smartphone, a tablet, a personaldigital assistant (PDA), an ultra mobile PC, a mobile phone, a desktopcomputer, a server, a printer, a scanner, a monitor, a set-top box, anentertainment control unit, a digital camera, a portable music player,or a digital video recorder. In further implementations, the computingdevice 900 may be any other electronic device that processes data.

The above description of illustrated implementations of embodiments ofthe disclosure, including what is described in the Abstract, is notintended to be exhaustive or to limit the disclosure to the preciseforms disclosed. While specific implementations of, and examples for,the disclosure are described herein for illustrative purposes, variousequivalent modifications are possible within the scope of thedisclosure, as those skilled in the relevant art will recognize.

These modifications may be made to the disclosure in light of the abovedetailed description. The terms used in the following claims should notbe construed to limit the disclosure to the specific implementationsdisclosed in the specification and the claims. Rather, the scope of thedisclosure is to be determined entirely by the following claims, whichare to be construed in accordance with established doctrines of claiminterpretation.

Example Embodiment 1

An integrated circuit structure comprises a first material blockcomprising a first block insulator layer and a first multilayer stack onthe first block insulator layer, the first multilayer stack comprisinginterleaved pillar electrodes and insulator layers. A second materialblock stacked is on the first material block comprising a second blockinsulator layer; and a second multilayer stack on the second blockinsulator layer, the second multilayer stack comprising interleavedpillar electrodes and insulator layers. At least one pillar extendsthrough the first material block and the second material block, whereinat least one pillar has a top width at a top of the first and secondmaterial blocks that is greater than a bottom width at a bottom of thefirst and second material blocks.

Example Embodiment 2

The integrated circuit structure of example embodiment 1, the top widthis less than approximately 100 nm.

Example Embodiment 3

The integrated circuit of claim 1 or 2, wherein the at least one pillaris self-aligned from the second material block to the first materialblock.

Example Embodiment 4

The integrated circuit of claim 1, 2 or 3, wherein the at least onepillar exits the bottom of the first material block and is coupled to atleast one of selector lines and bit lines.

Example Embodiment 5

The integrated circuit of claim 1, 2, 3, or 4, wherein the at least onepillar comprises a switching layer and a pillar electrode, wherein theswitching layer is formed along sidewalls of the pillar.

Example Embodiment 6

The integrated circuit of claim 0, wherein the pillar electrodecomprises a conductive metal including at least one of Cu, Ru, Co, andW.

Example Embodiment 7

The integrated circuit of claim 0, wherein the switching layer compriseat least one of TaOx, NbOx, VOx, Al2O3, HfO2, TiOx, and NiOx.

Example Embodiment 8

The integrated circuit of claim 0, wherein the switching layer isapproximately 5-14 nm in thickness and the pillar electrode is less thanapproximately 100 nm in width.

Example Embodiment 9

The integrated circuit of claim 1, 2, 3, 4, 5, 6, 7 or 8, wherein thefirst and second material blocks are formed over a substrate on which ablock copolymer is formed thereon, the block copolymer comprising afirst polymer component and a second polymer component of a directself-assembly (DSA) process.

Example Embodiment 10

The integrated circuit of claim 0, wherein the first polymer componentand the second polymer component comprise a polystyrene (PS) componentand polymethylmethacrylate (PMMA) component, respectively.

Example Embodiment 11

A method of fabricating a vertical memory array comprises forming afirst material block over a substrate, the first material blockcomprising a first block insulator layer, a first multilayer stack onthe block insulator layer, the first multilayer stack comprisinginterleaved pillar electrodes and insulator layers. A second materialblock is formed on the first material block, where the second materialblock comprises a second block insulator layer, a second multilayerstack on the block insulator layer, the second multilayer stackcomprising interleaved pillar electrodes and insulator layers. Duringfabrication of the first material block and the second material block,at least one pillar is formed that extends through the first materialblock and the second material block, wherein the at least one pillar isformed using a DSA process such that the pillar has a top width at a topof the first and second material blocks that is greater than a bottomwidth at a bottom of the first and second material blocks.

Example Embodiment 12

The method of example embodiment 11, the top width is less thanapproximately 100 nm.

Example Embodiment 13

The method of claim 11 or 12, wherein the at least one pillar isself-aligned from the second material block to the first material block.

Example Embodiment 14

The method of claim 11, 12, or 13, wherein the at least one pillar exitsthe bottom of the first material block and is coupled to at least one ofselector lines and bit lines.

Example Embodiment 15

The method of claim 11, 12, 13 or 14, wherein the at least one pillarcomprises a switching layer and a pillar electrode, wherein theswitching layer is formed along sidewalls of the pillar.

Example Embodiment 16

The method of claim 15, wherein the pillar electrode comprises aconductive metal including at least one of Cu, Ru, Co, and W.

Example Embodiment 17

The method of claim 15, wherein the switching layer is selected from agroup comprising TaOx, NbOx, VOx, Al2O3, HfOx, TaHfOx, TiOx, HfTiOx,HfNiOx, HfNbOx, TaNbOx, NiOx, PCMO, LSMO, In2O3, TaOx, NiOx, IGZO, ZnO,and composites thereof.

Example Embodiment 18

The method of claim 15, wherein the switching layer is approximately5-14 nm in thickness and the pillar electrode is less than approximately100 nm in width.

Example Embodiment 19

The method of claim 11, 12, 13, 14, 15, 16, 17 or 18, wherein the firstand second material blocks are formed over a substrate on which a blockcopolymer is formed thereon, the block copolymer comprising a firstpolymer component and a second polymer component of a directself-assembly (DSA) process.

Example Embodiment 20

The method of claim 19, wherein the first polymer component and thesecond polymer component comprise a polystyrene (PS) component andpolymethylmethacrylate (PMMA) component, respectively.

Example Embodiment 21

A method of fabricating a vertical memory array comprises forming afirst material block by: forming a first block insulator over asubstrate, forming a first multilayer stack of alternating planeelectrodes and insulator layers over the first block insulator; andforming at least one pillar through multilayer stack and the blockinsulator layer. A first direct self-assembly (DSA) process is performedon a surface of the first material block, wherein a first polymercomponent adheres to the at least one pillar and a second polymercomponent adheres to a top one of the insulator layers. The secondpolymer component is removed from insulator layer, a second blockinsulator of a second material block is formed in place of the removedsecond polymer component, and the first polymer component is removedfrom the at least one pillar. A second multilayer stack of alternatingplane electrodes and insulator layers conformably is over the secondblock insulator, and filling in a top of the second multilayer stackwith a metal comprising the at least one pillar. A second DSA process isperformed is performed on a top surface of the second material block todefine a location of the at least one pillar through the second materialblock that is self-aligned with a location of the at least one pillar inthe first material block, wherein the first polymer component adheres tothe metal and the second polymer component adheres to a top one of theinsulator layers in the second material block. The second polymercomponent is removed and replaced with a hardmask and the hardmask andthe first polymer component are polished to a predetermined thickness.The first polymer component is removed and the materials thereunder areetched, including the metal, down to the pillar at the top of the firstmaterial block. The hardmask is removed and a second portion of thepillar is formed in the second material block to extend the pillarthrough both the first material block and the second material block,wherein the portions of the pillar in the first material block and thesecond material block have a top width (TW) that is greater than abottom width.

Example Embodiment 22

The method of example embodiment 21, further comprising forming the atleast one pillar such that the top width is less than approximately 100nm.

Example Embodiment 23

The method of example embodiment 21 or 22, further comprising: selectingDSA morphologies as a function (f) that produce cylinder or sphericalmorphologies for the first polymer component and the second polymercomponent.

Example Embodiment 24

The method of example embodiment 23, further comprising: utilizingpolystyrene-bpolymethylmethacrylate (PS-b-PMMA) as the block copolymer.

Example Embodiment 25

The method of example embodiment 24, further comprising: selecting aFlory-Huggins X_(n) value of approximately 40-60.

What is claimed is:
 1. An integrated circuit structure, comprising: afirst material block comprising: a first block insulator layer; and afirst multilayer stack on the first block insulator layer, the firstmultilayer stack comprising interleaved pillar electrodes and insulatorlayers; and a second material block stacked on the first material block,comprising: a second block insulator layer; and a second multilayerstack on the second block insulator layer, the second multilayer stackcomprising interleaved pillar electrodes and insulator layers; and atleast one pillar extending through the first material block and thesecond material block, wherein the at least one pillar has a top widthat a top of the first and second material blocks that is greater than abottom width at a bottom of the first and second material blocks.
 2. Theintegrated circuit structure of claim 1, wherein the top width is lessthan approximately 100 nm.
 3. The integrated circuit structure of claim1, wherein the at least one pillar is self-aligned from the secondmaterial block to the first material block.
 4. The integrated circuitstructure of claim 1, wherein the at least one pillar exits the bottomof the first material block and is coupled to at least one of selectorlines and bit lines.
 5. The integrated circuit structure of claim 1,wherein the at least one pillar comprises a switching layer and a pillarelectrode, wherein the switching layer is formed along sidewalls of theat least one pillar.
 6. The integrated circuit structure of claim 5,wherein the pillar electrode comprises a conductive metal including atleast one of Cu, Ru, Co, and W.
 7. The integrated circuit structure ofclaim 5, wherein the switching layer is selected from a group comprisingTaOx, NbOx, VOx, Al2O3, HfOx, TaHfOx, TiOx, HfTiOx, HfNiOx, HfNbOx,TaNbOx, NiOx, PCMO, LSMO, In2O3, TaOx, NiOx, IGZO, ZnO, and compositesthereof.
 8. The integrated circuit structure of claim 5, wherein theswitching layer is approximately 5-14 nm in thickness and the pillarelectrode is less than approximately 100 nm in width.
 9. The integratedcircuit structure of claim 1, wherein the first and second materialblocks are formed over a substrate on which a block copolymer is formedthereon, the block copolymer comprising a first polymer component and asecond polymer component of a direct self-assembly (DSA) process. 10.The integrated circuit structure of claim 9, wherein the first polymercomponent and the second polymer component comprise a polystyrene (PS)component and polymethylmethacrylate (PMMA) component, respectively. 11.A method of fabricating a vertical memory array, the method comprising:forming a first material block over a substrate, the first materialblock comprising a first block insulator layer, and a first multilayerstack on the first block insulator layer, the first multilayer stackcomprising interleaved pillar electrodes and insulator layers; forming asecond material block on the first material block, wherein the secondmaterial block comprises a second block insulator layer, and a secondmultilayer stack on the second block insulator layer, the secondmultilayer stack comprising the interleaved pillar electrodes and theinsulator layers; and during fabrication of the first material block andthe second material block, forming at least one pillar that extendsthrough the first material block and the second material block, whereinthe at least one pillar is formed using a direct self-assembly (DSA)process such that the at least one pillar has a top width at a top ofthe first and second material blocks that is greater than a bottom widthat a bottom of the first and second material blocks.
 12. The method ofclaim 11, further comprising forming the at least one pillar such thatthe top width is less than approximately 100 nm.
 13. The method of claim11, further comprising forming the at least one pillar to beself-aligned from the second material block to the first material block.14. The method of claim 11, further comprising forming the at least onepillar such that the at least one pillar exits the bottom of the firstmaterial block and is coupled to at least one of selector lines and bitlines.
 15. The method of claim 11, further comprising forming the atleast one pillar to comprise a switching layer and a pillar electrode,wherein the switching layer is formed along sidewalls of the at leastone pillar.
 16. The method of claim 15, further comprising forming thepillar electrode to comprise a conductive metal including at least oneof Cu, Ru, Co, and W.
 17. The method of claim 15, further comprisingforming the switching layer is selected from a group comprising TaOx,NbOx, VOx, Al2O3, HfOx, TaHfOx, TiOx, HfTiOx, HfNiOx, HfNbOx, TaNbOx,NiOx, PCMO, LSMO, In2O3, TaOx, NiOx, IGZO, ZnO, and composites thereof.18. The method of claim 15, further comprising forming the switchinglayer to have a thickness of approximately 5-14 nm and forming thepillar electrode to have a width less than approximately 100 nm.
 19. Themethod of claim 11, further comprising forming the first and secondmaterial blocks over the substrate and depositing a block copolymerthereon, the block copolymer comprising a first polymer component and asecond polymer component of the DSA process.
 20. The method of claim 19,wherein the first polymer component and the second polymer componentcomprise a polystyrene (PS) component and polymethylmethacrylate (PMMA)component, respectively.
 21. A method of fabricating a vertical memoryarray, the method comprising: forming a first material block by: forminga first block insulator layer over a substrate, forming a firstmultilayer stack of alternating plane electrodes and insulator layersover the first block insulator layer; and forming at least one pillarthrough multilayer stack and the first block insulator layer; performinga first direct self-assembly (DSA) process on a surface of the firstmaterial block, wherein a first polymer component adheres to the atleast one pillar and a second polymer component adheres to a top one ofthe insulator layers; removing the second polymer component frominsulator layer, forming a second block insulator layer of a secondmaterial block in place of the removed second polymer component, andremoving the first polymer component from the at least one pillar;forming a second multilayer stack of alternating plane electrodes andthe insulator layers conformably over the second block insulator layer,and filling in a top of the second multilayer stack with a metalcomprising the at least one pillar; performing a second DSA process on atop surface of the second material block to define a location of the atleast one pillar through the second material block that is self-alignedwith a location of the at least one pillar in the first material block,wherein the first polymer component adheres to the metal and the secondpolymer component adheres to a top one of the insulator layers in thesecond material block; removing and replacing the second polymercomponent with a hardmask and polishing the hardmask and the firstpolymer component to a predetermined thickness; removing the firstpolymer component and etching materials thereunder, including the metal,down to the at least one pillar at the top of the first material block;and removing the hardmask and forming a second portion of the at leastone pillar in the second material block to extend the at least onepillar through both the first material block and the second materialblock, wherein portions of the at least one pillar in the first materialblock and the second material block have a top width (TW) that isgreater than a bottom width.
 22. The method of claim 21, furthercomprising forming the at least one pillar such that the top width isless than approximately 100 nm.
 23. The method of claim 22, furthercomprising: selecting DSA morphologies as a function (f) that producecylinder or spherical morphologies for the first polymer component andthe second polymer component.
 24. The method of claim 21, furthercomprising: utilizing polystyrene-bpolymethylmethacrylate (PS-b-PMMA) asa block copolymer.
 25. The method of claim 24, further comprising:selecting a Flory-Huggins X_(n) value of approximately 40-60.